Ultra-Sonic & Sweep-Sonic System

Cavitation generated by the ultra sonic liquid resonance removes particles.

Ultra sonic oscillator employs high performance transistor and frequency can be selected according to your application.

Effective for Silicon wafers, magnetic disks, lens, cassette(wafer carrier)and etc which need removal of particles greater than 1µ.

Manages wavelength of the standing wave by ultra sonic and achieves uniform power intensity.

Optimum cleaning for Silicon, GaAs, photo mask, magnetic disk and etc that require high performance in cleaning and no damage to those materials.